Product Features: This product is an alumina polishing liquid, which is produced by processing α - Al₂O₃, stabilizers, surfactants, pH regulators, preservatives, defoamers, etc. The particle size can be customized according to requirements. It has the following characteristics:

1. Good suspension and dispersion, with stable product quality.

2. High polishing efficiency, greatly reducing processing time.

3. The processed parts have a high - precision surface, low roughness, and no scratches or other visible defects

4. Easy to clean and leaves no residue.

Product Applications: Sapphire substrates, sapphire windows

Product Cases: In recent years, with the rapid development of the semiconductor industry, the demand for sapphire substrates has increased. Due to the low polishing efficiency of traditional silica polishing liquids, the production capacity of sapphire substrate wafers is limited, which directly affects the development of the semiconductor industry. This product uses high - hardness α - Al₂O₃ as the raw material. Under the action of abrasive auxiliaries, it realizes a high - degree combination of mechanical and chemical effects, and prepares a new type of sapphire polishing liquid, solving some problems existing in the current use of sapphire polishing liquids.